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Vol 53, No 3 (2024)
Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
Murin D.B., Grazhdyan A.Y., Chesnokov I.A., Gogulev I.A.
PDF
(Rus)
Vol 52, No 3 (2023)
Hydrogen Plasma under Conditions of Electron-Cyclotron Resonance in Microelectronics Technology
Polushkin E.A., Nefed’ev S.V., Koval’chuk A.V., Soltanovich O.A., Shapoval S.Y.
PDF
(Rus)
Vol 52, No 6 (2023)
OPTICALLY PUMPED BIPOLAR TRANSISTOR
Altudov Y.K., Gaev D.S., Pskhu A.V., Rekhviashvili S.S.
PDF
(Rus)
Vol 52, No 6 (2023)
Electrophysical parameters of p-i-n photodiodes, irradiated with 60Co γ-quanta
Kovalchuk N.S., Lastovsky S.B., Odzhaev V.B., Petlitsky A.N., Prosolovich V.S., Shestovsky D.V., Yavid V.Y., Yankovsky Y.N.
PDF
(Rus)
Vol 52, No 6 (2023)
PROBE AND SPECTRAL DIAGNOSTICS OF PLASMA GAS ENVIRONMENT: BCl3-Cl2
Murin D.B., Chesnokov I.A., Gogulev I.A., Grishkov A.E.
PDF
(Rus)
Vol 53, No 2 (2024)
The new approach of a simulation low dose rate radiation effects in bipolar integrated circuits
Chumakov A.I.
PDF
(Rus)
Vol 53, No 3 (2024)
The Effect оf Laser Radiation оn Functional Properties of MOS Structures
Rekhviashvili S.S., Gaev D.S.
PDF
(Rus)
Vol 53, No 5 (2024)
Electron cyclotron resonance plasma studies using the second cyclotron harmonic resonance
Kovalchuk А.V., Shapoval S.Y.
PDF
(Rus)
Vol 52, No 1 (2023)
Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy
Murin D.B., Chesnokov I.A., Pivovarenok S.A., Efremov A.M.
PDF
(Rus)
Vol 53, No 4 (2024)
Plasmochemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium
Murin D.B., Chesnokov I.A., Gogulev I.A., Anokhin A.L., Moloskin A.E.
PDF
(Rus)
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