On the features of the formation of polar distribution of sputtered atoms in the md model of the (001) Ni face sputtering

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Abstract

Using a modern complete molecular dynamics model of single crystal sputtering taking into account ion incidence on the surface, the mechanisms of formation of the polar and azimuthal angle distribution of atoms sputtered from the surface of the (001) Ni face by Ar ions with an energy of 200 eV are studied. It is shown that the sputtered atoms, over focused by the azimuthal angle, eject only near the directions corresponding to the directions to the centers of lenses of two atoms in the surface plane neighboring to the ejecting atom. It is found that in the polar angular distribution of sputtered atoms with an energy of 2.5 ± 0.1 eV in the range of the azimuthal angle of 87° ± 1.5°, close to the center of the lens, three maxima formed by atoms with significantly different mechanisms of emission are observed. It is concluded that the formation of these maxima occurs only due to the surface mechanism of single crystal sputtering.

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About the authors

A. I. Musin

Moscow State University of Technology “STANKIN”, Institute of Digital Intelligent Systems; Vyatka State University, Institute of Mathematics and Information Systems

Author for correspondence.
Email: samoilov@polly.phys.msu.ru
Russian Federation, Moscow; Kirov

V. N. Samoilov

Lomonosov Moscow State University, Faculty of Physics

Email: samoilov@polly.phys.msu.ru
Russian Federation, Moscow

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Supplementary files

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2. Fig. 1. Characteristic trajectories of emission of focused (a) and overfocused (b) atoms during scattering on a lens of two surface atoms closest to the emitted atom (top view).

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3. Fig. 2. Angular distribution of all sputtered atoms obtained in the MD model of sputtering of the (001) Ni face by Ar ions with an energy of 200 eV at a target temperature of 0 K. The number of incident ions is ∼106.

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4. Fig. 3. Angular distribution of overfocused sputtered atoms obtained in the MD model of sputtering of the (001) Ni face by Ar ions with an energy of 200 eV at a target temperature of 0 K. The number of incident ions is ∼106.

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5. Fig. 4. Distribution by 1 — cosθ of atoms sputtered from the (001) face of Ni under bombardment with Ar ions with an energy of 200 eV, observed in the range of the azimuthal angle φ = 87° ± 1.5° with an energy E = 2.5 ± 0.1 eV. Three separate maxima are formed by atoms that are proper in the azimuthal angle (maximum I) and mainly overfocused atoms (maxima II, III).

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